Hallett-Tapley, Geniece L, Wee, Tse-Luen Erika, Eldo, Joby, Jackson, Edward A, Blackwell, James M, Scaiano, Juan C (2012) Ionic Carbamate Photoacid/Photobase Generators for the Advancement of Dual Tone Photolithography. In: UNSPECIFIED.
Abstract
Current work in lithographic patterning has been carried out using 193 nm excitation sources, limiting the pitch division to approximately λ/2 and, thus, the advancement of Moore's law. Recently, double patterning has emerged as a potential extension of 193 nm techniques as two lines can be patterned in one exposure. In this contribution, the double patterning features of single component carbamate photoacid/photobase generators (PAG/PBG) are examined. At lower exposure doses, sulfonic acid is generated, while at higher doses, a photochemical rearrangement is initiated to activate the PBG. Optimally, at intermediate doses, photoacid and photobase components can exist concurrently resulting in the desired dual tone lithographic features. The energy required to initiate dual tone behavior can be tailored through co-added amine quenchers and carbamate concentration. Using ellipsometry, the energy required for the resists to have the first sign of photoacid generation (film dissolution), E 0, and at the energy required for photobase activation (E nn) were determined, as this value dictates the ability to achieve the desired pitch division. Finally, laser flash photolysis (LFP) was used as a tool to gain some insight into the mechanism responsible for the PBG activating rearrangement reaction.
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| CSHL Authors: | |
| Communities: | CSHL labs > Spector lab |
| SWORD Depositor: | CSHL Elements |
| Depositing User: | CSHL Elements |
| Date: | 2012 |
| Date Deposited: | 04 Jan 2024 20:53 |
| Last Modified: | 04 Jan 2024 20:53 |
| Related URLs: | |
| URI: | https://repository.cshl.edu/id/eprint/41389 |
Actions (login required)
 |
Administrator's edit/view item |